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SoftPG.com is a free website to serial numbers, registration codes, license keys, activations.. be about online crack, serial key, patch, activations, serial number or keygen and. FoneTools 8 Serial Number Registration. Abbys Lingvo Crack.I. Field of the Invention
The present invention relates to methods for rapidly and conveniently repairing defects in the formation and/or distribution of a patterned resist layer formed on a substrate in the manufacture of integrated circuits.
II. Description of the Prior Art
A variety of methods for forming patterned resist layers on a substrate are known in the art. Such a method is typically used, for example, to define the regions of conductive material (e.g., a metal layer) that will be formed as part of an integrated circuit during subsequent fabrication steps. Typically, a photoresist layer is formed on a substrate, exposed, and developed to define a pattern of resist regions. Then, while the region defined by the pattern is covered by the patterned resist layer, a layer of conductive material is deposited (e.g., by sputtering) through the openings formed by the pattern. Subsequently, the resist layer is removed.
One of the problems encountered in the use of photoresist layers to define conductive features (i.e., conductive lines or vias) in the formation of integrated circuits is that defects are frequently caused in the formation of the layer of photoresist on the substrate. These defects are believed to result from various problems in the manufacturing processes used to produce the integrated circuits. For example, defects are believed to be caused by material that unintentionally attaches to and/or contaminates a mask used to expose a photoresist layer and/or defects that are formed in the photoresist layer itself.
In the manufacture of integrated circuits on a semiconductor substrate, the defects in the photoresist layer formed on the substrate can have significant effects. For example, defects in the photoresist layer can expose the underlying substrate. As a result, material that is deposited on the substrate through the photoresist layer is formed in regions of the substrate that were not intended to be filled with the conductive material. This can result in formation of conductive material in regions of the integrated circuit that are not functional. Further, the thicknesses of the various layers of conductive material in the integrated circuit can vary. In the case where the conductive material is subsequently etched, for example, to form the
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